Our production of fine grinding solution is featured Micron and submicroscopic of dispersible in water, oil, and other media, and has good polishing properties, mainly used in optical communications, wafers, optical crystals, liquid crystal panel, gem, metallographic analysis and other fields. According to types of abrasive grinding liquid products are mainly divided into diamonds, silicon carbide abrasive liquid, slurry of alumina,cerium oxide abrasive fluids.
我司生产的精细研磨液是将精选的微米、亚微米级磨料分散在水、油等介质中而成，具有良好的研磨抛光性能，主要应用于光通信、硅片、光学晶体、液晶面板、宝石、金相分析等领域。根据磨料种类产品主要分为金刚石研磨液、碳化硅研磨液、氧化铝研磨液、氧化铈研磨液。
Product features
- Selection of abrasive particles regular morphology, particle size distribution, with a good polishing results；
- Abrasive dispersion and suspension is good, easy to use, with no surface scratches;
- Easy to clean, ground stabilization, polished good consistency.
|
Type |
Abrasives |
Size/μm |
concentration/% |
medium |
|
PS-SC3 |
Silicon Carbide |
3 |
50 |
water |
|
PS-AO2 |
aluminium oxide |
2 |
50 |
water |
|
PS-AO1 |
1 |
50 |
water |
|
|
PS-CO1 |
Cerium Oxide |
1 |
50 |
water |
|
PS-CO2 |
0.5 |
50 |
water |
- Ceramic ferrule for optical communications industry, plastic polishing MTferrule, optical fiber arrays;
- Optical glass, crystals, precision polishing and repair of LCD substrates;
- Wafers, compound semiconductor wafer polishing, LED Sapphire substrates.
产品特性
◆ 精选磨料，颗粒形貌规整、粒度分布集中，具有良好的研磨抛光效果；
◆ 磨料分散性和悬浮性良好，使用方便，不会造成工件表面的划伤；
◆ 易清洗，研磨速率稳定，抛光一致性好。
产品型号
|
型号 |
磨料 |
粒径/μm |
浓度/% |
介质 |
|
PS-SC3 |
碳化硅 |
3 |
50 |
水 |
|
PS-AO2 |
氧化铝 |
2 |
50 |
水 |
|
PS-AO1 |
1 |
50 |
水 |
|
|
PS-CO1 |
氧化铈 |
1 |
50 |
水 |
|
PS-CO2 |
0.5 |
50 |
水 |
◆ 光通讯行业中陶瓷插芯、塑料MT插芯、光纤阵列的研磨抛光；
◆ 光学玻璃、晶体、LCD基板的精密抛光和修复；
◆ 硅片、化合物半导体硅片、LED蓝宝石衬底的抛光。
包装及储存
◆ 采用高密度聚乙烯瓶包装，主要包装是250ml、500ml；
◆ 贮存时应避免曝晒，贮存温度为0-40℃，低于0℃可能会结块失效。