Polishing Slurry made by Micron and sub-micron and nano abrasive particles dispersed in the liquid medium such as water or oil in the configuration form, with excellent polishing 研磨液 是由微米、亚微米、纳米级研磨微粒分散于水性或油性等液体介质中配置而成,具有良好研磨抛光性能。我司生产的精细研磨液主要为金刚石、碳化硅、氧化铝、氧化铈研磨液,二氧化硅抛光液(CMP抛光液),光纤专用研磨液,光纤研磨油等产品,主要应用于光通信、硅片、光学晶体、液晶面板、蓝宝石properties. Our production of refined main grinding fluid for diamond and silicon carbide, aluminum oxide and cerium oxide polishing slurry, polishing slurry of silica (CMP polishing slurry),fiber-optic special grinding fluid, fiber grinding oil and other products,mainly used in optical communications, wafer, liquid crystal panel,Sapphire, optical crystals, metallographic analysis and other fields.
、金相分析等领域。



